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Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California / Phillip D. Blais, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics. (Proceedings of SPIE--the International Society for Optical Engineering ; v. 537)

Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California / Phillip D. Blais, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics. (Proceedings of SPIE--the International Society for Optical Engineering ; v. 537)
Paper図書
SPIE--the International Society for Optical Engineeringc1985.<M15-A1319>
National Diet Library
  • Subject Heading...-- Congresses. Ion beam lithography -- Congresses.

Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III : March 15-16, 1984, Santa Clara, California / Alfred Wagner, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics. (Proceedings of SPIE--the International Society for Optical Engineering ; v. 471)

Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III : March 15-16, 1984, Santa Clara, California / Alfred Wagner, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics. (Proceedings of SPIE--the International Society for Optical Engineering ; v. 471)
Paper図書
SPIE--the International Society for Optical Engineeringc1984.<M15-A4747>
National Diet Library
  • Subject Heading...-- Congresses. Ion beam lithography -- Congresses.

Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California

Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California
Paper図書
David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECHSPIEc1996
Other Libraries in Japan
  • Subject Heading... -- Congresses Ion beam lithography -- Congresses
  • Subject Heading (ID)... -- Congresses Ion beam lithography -- Congresses

Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California

Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California
Paper図書
David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials InternationalSPIEc1994
Other Libraries in Japan
  • Subject Heading... -- Congresses Ion beam lithography -- Congresses Semiconductors -- Etching -- ...
  • Subject Heading (ID)... -- Congresses Ion beam lithography -- Congresses Semiconductors -- Etching -- ...

Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California

Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California
Paper図書
Martin Peckerar, chair/editor ; sponsored and published by SPIE--the International Society for Optical EngineeringSPIEc1991
Other Libraries in Japan
  • Subject Heading... -- Congresses Ion beam lithography -- Congresses
  • Subject Heading (ID)... -- Congresses Ion beam lithography -- Congresses

Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III : 1-2 March 1993, San Jose, California pbk.

Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III : 1-2 March 1993, San Jose, California pbk.
Paper図書
David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical EngineeringThe Societyc1993
Other Libraries in Japan
  • Subject Heading... -- Congresses Ion beam lithography -- Congresses Semiconductors -- Etching -- ...
  • Subject Heading (ID)... -- Congresses Ion beam lithography -- Congresses Semiconductors -- Etching -- ...

Proceedings of the 36th International Symposium on Electron, Ion, and Photon Beams, 26-29 May 1992 The Peaboy Hotel, Orland, Glorida

Proceedings of the 36th International Symposium on Electron, Ion, and Photon Beams, 26-29 May 1992 The Peaboy Hotel, Orland, Glorida
Paper図書
special editor for the proceedings, Randy KubenaPublished for the American Vacuum Society by the American Institute of Physics1992
Other Libraries in Japan
  • Subject Heading... -- Congresses Ion beam lithography -- Congresses X-ray lithography -- Congress...
  • Subject Heading (ID)... -- Congresses Ion beam lithography -- Congresses X-ray lithography -- Congress...

Electron-beam, x-ray, and ion-beam submicrometer lithographies for manufacturing II : 8-9 March 1992, San Jose, California

Electron-beam, x-ray, and ion-beam submicrometer lithographies for manufacturing II : 8-9 March 1992, San Jose, California
Paper図書
Martin Peckerar, chair/editor ; sponsored and published by SPIE--the International Society for Optical EngineeringSPIEc1992
Other Libraries in Japan
  • Subject Heading... -- Congresses Ion beam lithography -- Congresses Semiconductors -- Etching -- ...
  • Subject Heading (ID)... -- Congresses Ion beam lithography -- Congresses Semiconductors -- Etching -- ...

Proceedings of the 35th International Symposium on Electron, Ion, and Photon Beams, 28-31 May 1991 Seattle Sheraton Hotel & Towers, Seattle, Washington special casebound ed.

Proceedings of the 35th International Symposium on Electron, Ion, and Photon Beams, 28-31 May 1991 Seattle Sheraton Hotel & Towers, Seattle, Washington special casebound ed.
Paper図書
special editor for the proceedings, Jane ShawPublished for the American Vacuum Society by the American Institute of Physics1991
Other Libraries in Japan
  • Subject Heading... -- Congresses Ion beam lithography -- Congresses X-ray lithography -- Congress...
  • Subject Heading (ID)... -- Congresses Ion beam lithography -- Congresses X-ray lithography -- Congress...

Dry processing for submicrometer lithography : 12-13 October 1989, Santa Clara, California

Dry processing for submicrometer lithography : 12-13 October 1989, Santa Clara, California
Paper図書
James Bondur, Alan R. Reinberg, chairs/editors ; sponsored by SPIE--the International Society for Optical EngineeringThe Societyc1990
Other Libraries in Japan
  • Subject Heading... -- Congresses Ion beam lithography -- Congresses
  • Subject Heading (ID)... -- Congresses Ion beam lithography -- Congresses

Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California

Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California
Paper図書
Arnold W. Yanof, chair/editor ; sponsored by SPIE--the International Society for Optical EngineeringSPIEc1989
Other Libraries in Japan
  • Subject Heading... -- Congresses Ion beam lithography -- Congresses
  • Subject Heading (ID)... -- Congresses Ion beam lithography -- Congresses

Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VII : 2-4 March 1988, Santa Clara, California pbk.

Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VII : 2-4 March 1988, Santa Clara, California pbk.
Paper図書
Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical EngineeringThe Societyc1988
Other Libraries in Japan
  • Subject Heading... -- Congresses Ion beam lithography -- Congresses
  • Subject Heading (ID)... -- Congresses Ion beam lithography -- Congresses

Electron-beam, x-ray, and ion-beam lithographies VI : [proceedings] 5-6 March 1987, Santa Clara, California pbk.

Electron-beam, x-ray, and ion-beam lithographies VI : [proceedings] 5-6 March 1987, Santa Clara, California pbk.
Paper図書
Phillip D. Blais, chair/editor ; sponsored by SPIE--the International Society for Optical EngineeringThe Societyc1987
Other Libraries in Japan
  • Subject Heading... -- Congresses Ion beam lithography -- Congresses
  • Subject Heading (ID)... -- Congresses Ion beam lithography -- Congresses

Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, Santa Clara, California pbk.

Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, Santa Clara, California pbk.
Paper図書
Phillip D. Blais, chairman/editorSPIE--the International Society for Optical Engineeringc1986
Other Libraries in Japan
  • Subject Heading... -- Congresses Ion beam lithography -- Congresses
  • Subject Heading (ID)... -- Congresses Ion beam lithography -- Congresses

Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California pbk.

Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California pbk.
Paper図書
Philliip D. Blais, chairman/editor ; cooperating organization, the International Society for Hybrid MicroelectronicsSPIE--the International Society for Optical Engineeringc1985
Other Libraries in Japan
  • Subject Heading... -- Congresses Ion beam lithography -- Congresses
  • Subject Heading (ID)... -- Congresses Ion beam lithography -- Congresses

Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III : March 15-16, 1984, Santa Clara, California pbk.

Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III : March 15-16, 1984, Santa Clara, California pbk.
Paper図書
Alfred Wagner, chairman/editor ; cooperating organization, the International Society for Hybrid MicroelectronicsS.P.I.E.-- International Society for Optical Engineeringc1984
Other Libraries in Japan
  • Subject Heading... -- Congresses Ion beam lithography -- Congresses
  • Subject Heading (ID)... -- Congresses Ion beam lithography -- Congresses

Sixteenth Symposium on Electron, Ion, and Photon Beam Technology , Dallas, Texas, May 26-29, 1981 : Abstracts

Sixteenth Symposium on Electron, Ion, and Photon Beam Technology , Dallas, Texas, May 26-29, 1981 : Abstracts
Paper図書
[s.n.][1981]
Other Libraries in Japan
  • Subject HeadingElectron beams -- Congresses Ion beam lithography -- Congresses Photon beams -- Congresses
  • Subject Heading (ID)Electron beams -- Congresses Ion beam lithography -- Congresses Photon beams -- Congresses

Methods and materials in microelectronic technology

Methods and materials in microelectronic technology
Paper図書
edited by Joachim BargonPlenum Pressc1984
Other Libraries in Japan
  • Subject Heading... -- Congresses Ion beam lithography -- Congresses X-ray lithography -- Congress...
  • Subject Heading (ID)... -- Congresses Ion beam lithography -- Congresses X-ray lithography -- Congress...

Fifth International Vacuum Congress proceedings issue

Fifth International Vacuum Congress proceedings issue
Paper図書
editor, P. A. Redhead ; associated editor, G. Ehrlich ... [et al.] ; editorial board, R. W. Hoffman ... [et. al.] ; assistant to the editor, Jill BakerThe American Institute of Physicsc1972
Other Libraries in Japan
  • Subject Heading... -- Congresses Ion beam lithography -- Congresses X-ray lithography -- Congress...
  • Subject Heading (ID)... -- Congresses Ion beam lithography -- Congresses X-ray lithography -- Congress...

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