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Advanced etch technology and process integration for nanopatterning XI : 24-28 April 2022 : San Jose, California, United States : 23-27 May 2022 : online : 2022, ------. (SPIE Proceedings ; 12056)

Advanced etch technology and process integration for nanopatterning XI : 24-28 April 2022 : San Jose, California, United States : 23-27 May 2022 : online : 2022, ------. (SPIE Proceedings ; 12056)
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SPIE[2022]<M17-23-365>
国立国会図書館
  • 件名...noelectronics. Plasma etching.

Advanced etch technology for nanopatterning IV : 23-25 February 2015 : San Jose, California, United States : SPIE etch conference : international symposium on advanced lithography : Feb 2015, San Jose, CA. (SPIE Proceedings ; 9428)

Advanced etch technology for nanopatterning IV : 23-25 February 2015 : San Jose, California, United States : SPIE etch conference : international symposium on advanced lithography : Feb 2015, San Jose, CA. (SPIE Proceedings ; 9428)
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SPIE[2015]<M17-15-2754>
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  • 件名...noelectronics. Plasma etching. Semiconductors--Etching.

Plasma processing 19 : symposium "plasma processing 19" : PRiME 2012 joint international meeting of the Electrochemical Society and the Electrochemical Society of Japan : Oct 2012, Honolulu, HI. (ECS Transactions ; 50 (no. 46))

Plasma processing 19 : symposium "plasma processing 19" : PRiME 2012 joint international meeting of the Electrochemical Society and the Electrochemical Society of Japan : Oct 2012, Honolulu, HI. (ECS Transactions ; 50 (no. 46))
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The Electrochemical Society[2013]<M17-14-3090>
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Advanced etch technology for nanopatterning : 13-14 February 2012 : San Jose, California, United States : advanced etch technology for nanoatterning [i.e. nanopatterning] conference : SPIE advanced lithography symposium : 1st AETNC : Feb 2012, San Jose, CA. (SPIE Proceedings ; 8328)

Advanced etch technology for nanopatterning : 13-14 February 2012 : San Jose, California, United States : advanced etch technology for nanoatterning [i.e. nanopatterning] conference : SPIE advanced lithography symposium : 1st AETNC : Feb 2012, San Jose, CA. (SPIE Proceedings ; 8328)
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SPIEc2012.<M17-12-3838>
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Plasma processing 18 : symposium "plasma processing 18" : 219th meeting of the Electrochemical Society : May 2011, Montréal, Canada. (ECS Transactions ; 35 (no. 20))

Plasma processing 18 : symposium "plasma processing 18" : 219th meeting of the Electrochemical Society : May 2011, Montréal, Canada. (ECS Transactions ; 35 (no. 20))
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Electrochemical Societyc2011.<M17-13-947>
国立国会図書館

Advanced etch technology for nanopatterning III : 24-25 February 2014 : San Jose, California, United States : conference advanced etch technology for nanopatterning 3 : SPIE advanced lithography symposium 2014 : Feb 2014, San Jose, CA. (SPIE Proceedings ; 9054)

Advanced etch technology for nanopatterning III : 24-25 February 2014 : San Jose, California, United States : conference advanced etch technology for nanopatterning 3 : SPIE advanced lithography symposium 2014 : Feb 2014, San Jose, CA. (SPIE Proceedings ; 9054)
紙図書
SPIE[2014]<M17-14-2844>
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Principles of plasma discharges and materials processing : hardback 3rd edition

Principles of plasma discharges and materials processing : hardback 3rd edition
紙図書
Michael A. Lieberman, Allan J. LichtenbergJohn Wiley[2025]
全国の図書館

A Study on Plasma Process-Induced Defect Creation in Si-Based Devices

A Study on Plasma Process-Induced Defect Creation in Si-Based Devices
デジタル博士論文障害者向け資料あり
Sato, Yoshihiro2023-03-23
インターネットで読める国立国会図書館全国の図書館

A Study of Plasma-Induced Surface Roughness and Ripple Formation during Silicon Etching in Inductively Coupled Chlorine Plasmas

A Study of Plasma-Induced Surface Roughness and Ripple Formation during Silicon Etching in Inductively Coupled Chlorine Plasmas
デジタル博士論文障害者向け資料あり
Nakazaki, Nobuya2016-03-23
インターネットで読める国立国会図書館全国の図書館

A Study on Plasma Process-Induced Damage during Fabrication of Si Devices and Methodology for Optical Measurement

A Study on Plasma Process-Induced Damage during Fabrication of Si Devices and Methodology for Optical Measurement
デジタル博士論文障害者向け資料あり
Matsuda, Asahiko2013-05-23
インターネットで読める国立国会図書館全国の図書館

Low pressure plasmas and microstructuring technology

Low pressure plasmas and microstructuring technology
紙図書
Gerhard FranzSpringerc2009
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Microstructural characterization of reaction-formed silicon carbide ceramics [microform] / M. Singh and T.A. Leonhardt (NASA-TM ; 111692)

Microstructural characterization of reaction-formed silicon carbide ceramics [microform] / M. Singh and T.A. Leonhardt (NASA-TM ; 111692)
マイクロ図書
1995<YCA-NAS 1.15:111692>
国立国会図書館

Principles of plasma discharges and materials processing 2nd ed

Principles of plasma discharges and materials processing 2nd ed
紙図書
Michael A. Lieberman, Allan J. LichtenbergWiley-Intersciencec2005
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Plasma processes for semiconductor fabrication : hardback : pbk

Plasma processes for semiconductor fabrication : hardback : pbk
紙図書
W.N.G. HitchonCambridge University Press1999
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Proceedings of the Fifth Symposium on Plasma Processing / edited by G.S. Mathad, G.C. Schwartz, G. Smolinsky. (Proceedings)

Proceedings of the Fifth Symposium on Plasma Processing / edited by G.S. Mathad, G.C. Schwartz, G. Smolinsky. (Proceedings)
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Dielectrics and Insulation and Electronics Divisions, Electrochemical Societyc1985.<M15-A1400>
国立国会図書館

フルオロカーボンプラズマによる酸化シリコンエッチングにおけるプラズマ－表面相互作用の数値解析

フルオロカーボンプラズマによる酸化シリコンエッチングにおけるプラズマ－表面相互作用の数値解析
デジタル博士論文
Fukumoto, Hiroshi京都大学 (Kyoto University)2012-05-23
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Plasma etching : fundamentals and applications

Plasma etching : fundamentals and applications
紙図書
M. Sugawara ; with contributions from Barry L. Stansfield ... [et al.]Oxford University Press1998
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Plasma synthesis and etching of electronic materials : symposium held November 27-30, 1984, Boston, Massachusetts, U.S.A. / editors, R.P.H. Chang, B. Abeles. (Materials Research Society symposia proceedings ; v. 38)

Plasma synthesis and etching of electronic materials : symposium held November 27-30, 1984, Boston, Massachusetts, U.S.A. / editors, R.P.H. Chang, B. Abeles. (Materials Research Society symposia proceedings ; v. 38)
紙図書
Materials Research Societyc1985.<M15-A1043>
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Introduction to microlithography : theory, materials, and processing / L.F. Thompson, editor, C.G. Willson, editor, M.J. Bowden, editor ; based on a workshop sponsored by the ACS Division of Organic Coatings and Plastics Chemistry at the 185th Meeting of the American Chemical Society, Seattle, Washington, March 20-25, 1983. (ACS symposium series)

Introduction to microlithography : theory, materials, and processing / L.F. Thompson, editor, C.G. Willson, editor, M.J. Bowden, editor ; based on a workshop sponsored by the ACS Division of Organic Coatings and Plastics Chemistry at the 185th Meeting of the American Chemical Society, Seattle, Washington, March 20-25, 1983. (ACS symposium series)
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The Society1983.<M15-A52>
国立国会図書館全国の図書館

Principles of plasma discharges and materials processing

Principles of plasma discharges and materials processing
紙図書
Michael A. Lieberman, Allan J. LichtenbergWileyc1994
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