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Ultimate scaling of high-κ gate dielectrics and impact on carrier transport of field-effect transistors

Ultimate scaling of high-κ gate dielectrics and impact on carrier transport of field-effect transistors
Paper博士論文
Takashi Ando [著][Takashi Ando][2010]<UT51-2010-M871>
National Diet Library

Low power transistor design with high-k gate dielectric for system-on-chip applications

Low power transistor design with high-k gate dielectric for system-on-chip applications
Paper博士論文
Yuri Yasuda-Masuoka [著][Yuri Yasuda-Masuoka][2008]<UT51-2009-R238>
National Diet Library

Physics and technology of high-k gate dielectrics 7. : 7th international symposium on high dielectric constant materials and gate stacks : 216th meeting of the Electrochemical Society : 2009 Vienna symposium : Oct 2009, Vienna, Austria. (ECS Transactions ; 25 (no. 6))

Physics and technology of high-k gate dielectrics 7. : 7th international symposium on high dielectric constant materials and gate stacks : 216th meeting of the Electrochemical Society : 2009 Vienna symposium : Oct 2009, Vienna, Austria. (ECS Transactions ; 25 (no. 6))
Paper図書
Electrochemical Societyc2009.<M17-10-1513>
National Diet Library

Physics and technology of high-k gate dielectrics 5. : 5th international symposium on high dielectric constant materials and gate stacks : Oct 2007, Washington, DC. (ECS Transactions ; 11 (no. 4))

Physics and technology of high-k gate dielectrics 5. : 5th international symposium on high dielectric constant materials and gate stacks : Oct 2007, Washington, DC. (ECS Transactions ; 11 (no. 4))
Paper図書
Electrochemical Societyc2007.<M17-08-545>
National Diet Library

Design, fabrication, and characterization of germanium MOSFETs with high-k gate dielectric stacks based on nitride interfacial layers

Design, fabrication, and characterization of germanium MOSFETs with high-k gate dielectric stacks based on nitride interfacial layers
Paper博士論文
Andrew P. Ritenour.Massachusetts Institute of Technology2007.<M-DIMIT-07-198>
National Diet Library

Physics and technology of high-k gate dielectrics 6. : 5th [i.e. 6th] international symposium on high dielectric constant materials and gate stacks : 214th meeting of the Electrochemical Society : Honolulu symposium : Oct 2008, Honolulu, HI. (ECS Transactions ; 16 (no. 5))

Physics and technology of high-k gate dielectrics 6. : 5th [i.e. 6th] international symposium on high dielectric constant materials and gate stacks : 214th meeting of the Electrochemical Society : Honolulu symposium : Oct 2008, Honolulu, HI. (ECS Transactions ; 16 (no. 5))
Paper図書
Electrochemical Societyc2008.<M17-09-662>
National Diet Library

Suppression of thermal interface degradation in high-k gate dielectrics/silicon by helium process

Suppression of thermal interface degradation in high-k gate dielectrics/silicon by helium process
Paper博士論文
Kouichi Muraoka [著][Kouichi Muraoka][2006]<UT51-2007-K335>
National Diet Library

Physics and technology of high-k gate dielectrics 4. : 4th international symposium on high dielectric constant gate stacks : symposium E3 ("atomic layer deposition applications 2") : Oct 2006, Cancun, Mexico. (ECS Transactions ; 3 (no. 3))

Physics and technology of high-k gate dielectrics 4. : 4th international symposium on high dielectric constant gate stacks : symposium E3 ("atomic layer deposition applications 2") : Oct 2006, Cancun, Mexico. (ECS Transactions ; 3 (no. 3))
Paper図書
Electrochemical Societyc2006.<M17-07-973>
National Diet Library

Physics and technology of high-k gate dielectrics 3. : 3rd international symposium on high dielectric constant gate stacks : symposium G2 ("atomic layer deposition applications") : Oct 2005, Los Angeles, CA. (ECS Transactions ; 1 (no. 5))

Physics and technology of high-k gate dielectrics 3. : 3rd international symposium on high dielectric constant gate stacks : symposium G2 ("atomic layer deposition applications") : Oct 2005, Los Angeles, CA. (ECS Transactions ; 1 (no. 5))
Paper図書
Electrochemical Societyc2006.<M17-07-18>
National Diet Library

Defects in high-k gate dielectric stacks : nano-electronic semiconductor devices. : NATO advanced research workshop on defects in advanced high-k dielectric nano-electronic semiconductor devices : DeHik'2005 : Jul 2005, St. Petersburg, Russia. (NATO Science Series. Series II, Mathematics, Physics and Chemistry ; 220)

Defects in high-k gate dielectric stacks : nano-electronic semiconductor devices. : NATO advanced research workshop on defects in advanced high-k dielectric nano-electronic semiconductor devices : DeHik'2005 : Jul 2005, St. Petersburg, Russia. (NATO Science Series. Series II, Mathematics, Physics and Chemistry ; 220)
Paper図書
Springerc2006.<M17-06-711>
National Diet Library

Physics and technology of high-k gate dielectrics 2 : proceedings of the second international symposium on high dielectric constant materials: materials science, processing, reliability, and manufacturing issues : held in Orlando, Florida, October 12-16, 2003. : Oct 2003, Orlando, FL. (PV ; 2003-22)

Physics and technology of high-k gate dielectrics 2 : proceedings of the second international symposium on high dielectric constant materials: materials science, processing, reliability, and manufacturing issues : held in Orlando, Florida, October 12-16, 2003. : Oct 2003, Orlando, FL. (PV ; 2003-22)
Paper図書
Electrochemical Societyc2004.<M17-04-2359>
National Diet Library
  • Alternative TitlePhysics and technology of high-k gate dielectrics 2 : proceedings of the 2nd in...
  • Alternative TitlePhysics and technology of high-k gate dielectrics 2 : proceedings of the 2nd in...

Studies on Ultrathin Silicon Nitride Film Formation for High-k Gate Dielectrics Using Plasma Enhanced Chemical Vapor Deposition

Studies on Ultrathin Silicon Nitride Film Formation for High-k Gate Dielectrics Using Plasma Enhanced Chemical Vapor Deposition
PaperDigital博士論文障害者向け資料あり
Hiroyuki Ohta [著][Hiroyuki Ohta]2001<UT51-2001-D237>
Available onlineNational Diet Library

Physics and technology of high-k gate dielectrics 1 : proceedings of the international symposium on high dielectric constant materials: materials science, processing, reliability, and manufacturing issues : held in Salt Lake City, Utah, October 20-24, 2002. : 1st international symposium on high dielectric constant materials: materials science, processing, reliability, and manufacturing issues : Oct 2002, Salt Lake City, UT. (PV ; 2002-28)

Physics and technology of high-k gate dielectrics 1 : proceedings of the international symposium on high dielectric constant materials: materials science, processing, reliability, and manufacturing issues : held in Salt Lake City, Utah, October 20-24, 2002. : 1st international symposium on high dielectric constant materials: materials science, processing, reliability, and manufacturing issues : Oct 2002, Salt Lake City, UT. (PV ; 2002-28)
Paper図書
Electrochemical Societyc2003.<M17-04-3239>
National Diet Library

高誘電率ゲート絶縁膜の高機能化に向けた化学構造および界面反応に関する研究

高誘電率ゲート絶縁膜の高機能化に向けた化学構造および界面反応に関する研究
Paper博士論文
山元隆志 [著][山元隆志][2012]<UT51-2012-C697>
National Diet Library
  • Alternative TitleStudy on chemical structure and interface reaction of advanced high-k gate dielectrics
  • Alternative TitleStudy on chemical structure and interface reaction of advanced high-k gate dielectrics

High-K Gate Dielectrics

High-K Gate Dielectrics
Paper図書
Wong, Hei, 白石, 賢二, Shiraishi, Kenji, 角嶋, 邦之, KAKUSHIMA, Kuniyuki, 岩井, 洋, IWAI, HIROSHIPan Stanford Publishing Pte. Ltd.2009Electronic Device Architectures for the Nano-CMOS Erap.105-140
Other Libraries in Japan

微細CMOS実現に向けた高誘電率ゲート絶縁膜に関する研究

微細CMOS実現に向けた高誘電率ゲート絶縁膜に関する研究
Paper博士論文
岩本邦彦 [著][岩本邦彦][2008]<UT51-2013-G61>
National Diet Library
  • Alternative TitleStudy of the high-k gate dielectrics for the ultra-scaled CMOSFETs
  • Alternative TitleStudy of the high-k gate dielectrics for the ultra-scaled CMOSFETs

High-k gate dielectrics

High-k gate dielectrics
Paper図書
edited by Michel HoussaInstitute of Physicsc2004
Other Libraries in Japan

Defects in high-κ gate dielectric stacks : nano-electronic semiconductor devices : pbk

Defects in high-κ gate dielectric stacks : nano-electronic semiconductor devices : pbk
Paper図書
edited by Evgeni GusevSpringerc2006
Other Libraries in Japan

Physics and technology of high-k gate dielectrics 3 4 5 6

Physics and technology of high-k gate dielectrics 3 4 5 6
Paper図書
editors, S. Kar ... [et al.] ; sponsoring divisions: Dielectric Science and Technology, Electronics and PhotonicsElectrochemical Societyc2006-
Other Libraries in Japan

Physicas and technology of high-k gate dielectrics : proceedings of the International Symposium on High Dielectric Constant Materials : Materials Science, Processing, and Reliability, and Manufacturing Issues [I] II

Physicas and technology of high-k gate dielectrics : proceedings of the International Symposium on High Dielectric Constant Materials : Materials Science, Processing, and Reliability, and Manufacturing Issues [I] II
Paper図書
editors, S. Kar ... [et al.] ; sponsoring divisions: Dielectric Science and Technology, ElectronicsElectrochemical Societyc2003-c2004
Other Libraries in Japan
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