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Advanced etch technology and process integration for nanopatterning XI : 24-28 April 2022 : San Jose, California, United States : 23-27 May 2022 : online : 2022, ------. (SPIE Proceedings ; 12056)

Advanced etch technology and process integration for nanopatterning XI : 24-28 April 2022 : San Jose, California, United States : 23-27 May 2022 : online : 2022, ------. (SPIE Proceedings ; 12056)
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SPIE[2022]<M17-23-365>
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Plasma processing 19 : symposium "plasma processing 19" : PRiME 2012 joint international meeting of the Electrochemical Society and the Electrochemical Society of Japan : Oct 2012, Honolulu, HI. (ECS Transactions ; 50 (no. 46))

Plasma processing 19 : symposium "plasma processing 19" : PRiME 2012 joint international meeting of the Electrochemical Society and the Electrochemical Society of Japan : Oct 2012, Honolulu, HI. (ECS Transactions ; 50 (no. 46))
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The Electrochemical Society[2013]<M17-14-3090>
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Advanced etch technology for nanopatterning : 13-14 February 2012 : San Jose, California, United States : advanced etch technology for nanoatterning [i.e. nanopatterning] conference : SPIE advanced lithography symposium : 1st AETNC : Feb 2012, San Jose, CA. (SPIE Proceedings ; 8328)

Advanced etch technology for nanopatterning : 13-14 February 2012 : San Jose, California, United States : advanced etch technology for nanoatterning [i.e. nanopatterning] conference : SPIE advanced lithography symposium : 1st AETNC : Feb 2012, San Jose, CA. (SPIE Proceedings ; 8328)
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SPIEc2012.<M17-12-3838>
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Advanced etch technology for nanopatterning IV : 23-25 February 2015 : San Jose, California, United States : SPIE etch conference : international symposium on advanced lithography : Feb 2015, San Jose, CA. (SPIE Proceedings ; 9428)

Advanced etch technology for nanopatterning IV : 23-25 February 2015 : San Jose, California, United States : SPIE etch conference : international symposium on advanced lithography : Feb 2015, San Jose, CA. (SPIE Proceedings ; 9428)
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SPIE[2015]<M17-15-2754>
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Plasma processing 18 : symposium "plasma processing 18" : 219th meeting of the Electrochemical Society : May 2011, Montréal, Canada. (ECS Transactions ; 35 (no. 20))

Plasma processing 18 : symposium "plasma processing 18" : 219th meeting of the Electrochemical Society : May 2011, Montréal, Canada. (ECS Transactions ; 35 (no. 20))
紙図書
Electrochemical Societyc2011.<M17-13-947>
国立国会図書館

Advanced etch technology for nanopatterning III : 24-25 February 2014 : San Jose, California, United States : conference advanced etch technology for nanopatterning 3 : SPIE advanced lithography symposium 2014 : Feb 2014, San Jose, CA. (SPIE Proceedings ; 9054)

Advanced etch technology for nanopatterning III : 24-25 February 2014 : San Jose, California, United States : conference advanced etch technology for nanopatterning 3 : SPIE advanced lithography symposium 2014 : Feb 2014, San Jose, CA. (SPIE Proceedings ; 9054)
紙図書
SPIE[2014]<M17-14-2844>
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Proceedings of the Fifth Symposium on Plasma Processing / edited by G.S. Mathad, G.C. Schwartz, G. Smolinsky. (Proceedings)

Proceedings of the Fifth Symposium on Plasma Processing / edited by G.S. Mathad, G.C. Schwartz, G. Smolinsky. (Proceedings)
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Dielectrics and Insulation and Electronics Divisions, Electrochemical Societyc1985.<M15-A1400>
国立国会図書館
  • 件名Plasma etching -- Congresses. Semiconductors -- Etching -- ...

Plasma synthesis and etching of electronic materials : symposium held November 27-30, 1984, Boston, Massachusetts, U.S.A. / editors, R.P.H. Chang, B. Abeles. (Materials Research Society symposia proceedings ; v. 38)

Plasma synthesis and etching of electronic materials : symposium held November 27-30, 1984, Boston, Massachusetts, U.S.A. / editors, R.P.H. Chang, B. Abeles. (Materials Research Society symposia proceedings ; v. 38)
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Materials Research Societyc1985.<M15-A1043>
国立国会図書館全国の図書館
  • 件名...-- Congresses. Plasma etching -- Congresses. Electronics -- Materials -- C...

Introduction to microlithography : theory, materials, and processing / L.F. Thompson, editor, C.G. Willson, editor, M.J. Bowden, editor ; based on a workshop sponsored by the ACS Division of Organic Coatings and Plastics Chemistry at the 185th Meeting of the American Chemical Society, Seattle, Washington, March 20-25, 1983. (ACS symposium series)

Introduction to microlithography : theory, materials, and processing / L.F. Thompson, editor, C.G. Willson, editor, M.J. Bowden, editor ; based on a workshop sponsored by the ACS Division of Organic Coatings and Plastics Chemistry at the 185th Meeting of the American Chemical Society, Seattle, Washington, March 20-25, 1983. (ACS symposium series)
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The Society1983.<M15-A52>
国立国会図書館全国の図書館
  • 件名Microlithography -- Congresses. Photoresists -- Congresses. Plasma etching -- Congresses.

2003 8th International Symposium on Plasma- and Process-Induced Damage, April 24-25, 2003, Corbeil-Essonnes, France

2003 8th International Symposium on Plasma- and Process-Induced Damage, April 24-25, 2003, Corbeil-Essonnes, France
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Koji Eriguchi, S. Krishnan, and Terence Hook, editorsIEEE Operations Centerc2003
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2002 7th International Symposium on Plasma- and Process-Induced Damage

2002 7th International Symposium on Plasma- and Process-Induced Damage
紙図書
Terence Hook, Koji Eriguchi, and Calvin T. Gabriel, editorsAVSc2002
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Thin film materials, processes, and reliability : proceedings of the international symposium

Thin film materials, processes, and reliability : proceedings of the international symposium
紙図書
editor, G.S. Mathad ; assistant editors, M. Engelhardt ...[et al.]Electrochemical Societyc2001
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2001 6th International Symposium on Plasma- and Process-Induced Damage, May 13-15, 2001, Monterey, California, USA : soft.

2001 6th International Symposium on Plasma- and Process-Induced Damage, May 13-15, 2001, Monterey, California, USA : soft.
紙図書
Manfred Engelhardt, Terence Hook, and Calvin T. Gabriel, ; technical co-sponsors, American Vacuum Society, IEEE/Electron Devices Society, Japanese Society of Applied PhysicsAmerican Vacuum Society - Northen California Chapterc2001
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1999 4th International Symposium on Plasma Process-Induced Damage, May 9-11, 1999, Monterey, California, USA :softbound

1999 4th International Symposium on Plasma Process-Induced Damage, May 9-11, 1999, Monterey, California, USA :softbound
紙図書
editors, Thuy Dao, Mitsumasa Koyanagi, Terence Hook ; technical co-sponsors,IEEE/Electron Devices Society, American Vacuum Society, Japan Society of Applied Physicsthe American Vacuum Societyc1999
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Proceedings of the International Symposium on Thin Film Materials, Processes, Reliability, and Applications, Thin Film Processes

Proceedings of the International Symposium on Thin Film Materials, Processes, Reliability, and Applications, Thin Film Processes
紙図書
editors, G.S. Mathad, M. Meyyappan, M. Engelhardt ; Dielectric Science & Technology, Electronics, and Electrodeposition DivisionsElectrochemical Societyc1998
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1998 3rd International Symposium on Plasma Process-Induced Damage, June 4-5, 1998, Honolulu, Hawaii, USA :softbound :microfiche

1998 3rd International Symposium on Plasma Process-Induced Damage, June 4-5, 1998, Honolulu, Hawaii, USA :softbound :microfiche
紙図書
editors, Moritaka Nakamura, Thuy Dao, and Terence Hook ; technical co-sponsors, American Vacuum Society, IEEE/Electron Devices Society, Japan Society of Applied PhysicsNorthern California Chapter of the American Vacuum Societyc1998
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1997 2nd International Symposium on Plasma Process-Induced Damage : 13-14 May 1997, Monterey, California, USA : softbound : microfiche

1997 2nd International Symposium on Plasma Process-Induced Damage : 13-14 May 1997, Monterey, California, USA : softbound : microfiche
紙図書
editors, Kim P. Cheung, Moritaka Nakamura, and Calvin T. Gabriel ; technical co-sponsors, IEEE/Electron Devices Society, American Vacuum Society, Japanese Society of Applied PhysicsNorthern California Chapter of the American Vacuum Societyc1997
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Introduction to microlithography 2nd ed

Introduction to microlithography 2nd ed
紙図書
edited by Larry F. Thompson, C. Grant Willson, Murrae J. BowdenAmerican Chemical Society1994
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Proceedings of the Ninth Symposium on Plasma Processing

Proceedings of the Ninth Symposium on Plasma Processing
紙図書
edited by G.S. Mathad, D.W. HessElectrochemical Societyc1992
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Microelectronics technology and process integration : 20-21 October 1994, Austin, Texas pbk.

Microelectronics technology and process integration : 20-21 October 1994, Austin, Texas pbk.
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Fusen E. Chen, Shyam P. Murarka, chairs/editors ; sponsored and published by SPIE--the International Society for Optical EngineeringSPIEc1994
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